According to an embodiment of a semiconductor device, the device includes a semiconductor body with a drift region and neighboring device cells integrated in the semiconductor body. Each device cell includes: a body region arranged between a source region and the drift region; a diode region and a pn junction between the diode region and the drift region; a trench with first and second opposing sidewalls and a bottom, the body region adjoining the first sidewall, the diode region adjoining the second sidewall, and the pn junction adjoining the bottom; and a gate electrode arranged in the trench and dielectrically insulated from the semiconductor body by a gate dielectric. The diode regions together with the drift region act as a JFET, which has a channel region in the drift region between the diode regions. The drift region has a locally increased doping concentration in the channel region of the JFET.