Invention Grant
- Patent Title: Method for manufacturing high purity glycol based compound
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Application No.: US14865493Application Date: 2015-09-25
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Publication No.: US10040741B2Publication Date: 2018-08-07
- Inventor: Jae Woo Jeong , Hong Sick Park , Bong Kyun Kim , Seung Ho Yoon , Sang Dai Lee , Young Jin Park , Hyo Won Park , Sang Moon Yun
- Applicant: Samsung Display Co. Ltd. , ENF TECHNOLOGY CO., LTD.
- Applicant Address: KR Yongin-si KR Seoul
- Assignee: Samsung Display Co., Ltd.,ENF TECHNOLOGY CO., LTD.
- Current Assignee: Samsung Display Co., Ltd.,ENF TECHNOLOGY CO., LTD.
- Current Assignee Address: KR Yongin-si KR Seoul
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2015-0051908 20150413
- Main IPC: C07C41/42
- IPC: C07C41/42 ; C07C41/46 ; B01D3/00
Abstract:
Provided is a method for manufacturing a glycol based compound. The method comprises agitating a mixture of a first glycol based compound, a hydrazide based compound, and a sulfonic acid based compound, and performing fractional distillation of resultant materials of the agitating to recover a second glycol based compound having a formaldehyde content of 0 ppm.
Public/Granted literature
- US20160297732A1 METHOD FOR MANUFACTURING HIGH PURITY GLYCOL BASED COMPOUND Public/Granted day:2016-10-13
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