Invention Grant
- Patent Title: Method of manufacturing photomask
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Application No.: US15225918Application Date: 2016-08-02
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Publication No.: US10042246B2Publication Date: 2018-08-07
- Inventor: Jong-Keun Oh , Hyung-Ho Ko , Byung-Gook Kim , Jae-Hyuck Choi , Jun-Youl Choi
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2013-0077847 20130703
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/22 ; G03F1/48 ; G03F1/54
Abstract:
A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
Public/Granted literature
- US20160342079A1 METHOD OF MANUFACTURING PHOTOMASK Public/Granted day:2016-11-24
Information query
