Invention Grant
- Patent Title: Silane coupling agent and method of manufacturing wire grid pattern using the same
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Application No.: US15168665Application Date: 2016-05-31
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Publication No.: US10042256B2Publication Date: 2018-08-07
- Inventor: Min Hyuck Kang , Eun Ae Kwak , Dong Eon Lee , Gug Rae Jo
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2015-0137627 20150930
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/004 ; C07F7/18 ; G02B5/30 ; C23F1/02 ; C23F1/00 ; G03F7/00

Abstract:
A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.
Public/Granted literature
- US20170090285A1 SILANE COUPLING AGENT AND METHOD OF MANUFACTURING WIRE GRID PATTERN USING THE SAME Public/Granted day:2017-03-30
Information query
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