Invention Grant
- Patent Title: Device for monitoring a radiation source, radiation source, method of monitoring a radiation source, device manufacturing method
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Application No.: US15508543Application Date: 2015-08-11
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Publication No.: US10042260B2Publication Date: 2018-08-07
- Inventor: Erik Willem Bogaart , Chuangxin Zhao
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP14184445 20140911
- International Application: PCT/EP2015/068466 WO 20150811
- International Announcement: WO2016/037786 WO 20160317
- Main IPC: G01N27/22
- IPC: G01N27/22 ; G01N27/00 ; G03F7/20 ; H05G2/00
Abstract:
Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.
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