Invention Grant
- Patent Title: Lithographic projection objective
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Application No.: US15294281Application Date: 2016-10-14
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Publication No.: US10042265B2Publication Date: 2018-08-07
- Inventor: Olaf Rogalsky , Boris Bittner , Thomas Petasch , Jochen Haeussler
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03F7/20
Abstract:
Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.
Public/Granted literature
- US20170031247A1 LITHOGRAPHIC PROJECTION OBJECTIVE Public/Granted day:2017-02-02
Information query
