Invention Grant
- Patent Title: Substrate processing apparatus and article manufacturing method
-
Application No.: US15585408Application Date: 2017-05-03
-
Publication No.: US10043697B2Publication Date: 2018-08-07
- Inventor: Masato Sato
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2016-094153 20160509
- Main IPC: B65G49/05
- IPC: B65G49/05 ; B65G37/00 ; B65G47/90 ; H01L21/677 ; H01L21/67 ; H01L21/68 ; H01L21/70

Abstract:
A substrate processing apparatus including a plurality of processing devices each of which processes a substrate is provided. The apparatus comprises a conveying device including a conveyance path and conveys, to one of the plurality of processing devices, a substrate conveyed into one end of the conveyance path from an outside of the substrate processing apparatus, and an adjusting device configured to perform adjustment of a pre-alignment state of the substrate conveyed from the one end and to be conveyed into one of the plurality of processing devices, wherein the adjusting device is arranged on the conveyance path and between a processing devices of the plurality of processing devices, farthest from the one end, and a processing device, of the plurality of processing devices, closest to the one end.
Public/Granted literature
- US20170323816A1 SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD Public/Granted day:2017-11-09
Information query
IPC分类: