Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15000519Application Date: 2016-01-19
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Publication No.: US10043905B2Publication Date: 2018-08-07
- Inventor: Kosuke Yanagidaira , Kazuhide Yoneya
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/78 ; H01L27/092

Abstract:
According to one embodiment, a semiconductor device includes a first element isolating area, a first element area surrounding the first element isolating area, a second element isolating area surrounding the first element area a first gate electrode provided on and across the first element isolating area, the first element area, and the second element isolating area, and a second gate electrode isolated from the first gate electrode and provided on and across the first element isolating area, the first element area, and the second element isolating area.
Public/Granted literature
- US20170077303A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-03-16
Information query
IPC分类: