- Patent Title: Power system for supplying high voltage to an electron beam emitter
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Application No.: US15301573Application Date: 2015-01-21
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Publication No.: US10044181B2Publication Date: 2018-08-07
- Inventor: Dominique Corpataux , Willi Wandfluh , Robert Streit , Christoph Wünsch , Werner Haag
- Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.
- Applicant Address: CH Pully
- Assignee: TETRA LAVAL HOLDINGS & FINANCE S.A.
- Current Assignee: TETRA LAVAL HOLDINGS & FINANCE S.A.
- Current Assignee Address: CH Pully
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: SE1450414 20140404
- International Application: PCT/EP2015/051071 WO 20150121
- International Announcement: WO2015/149958 WO 20151008
- Main IPC: H02H7/10
- IPC: H02H7/10 ; H02M1/32 ; A61L2/08 ; A23L3/26 ; B65B55/02

Abstract:
Power system for supplying high voltage to an electron beam emitter, which is adapted to sterilize a packaging container or a packaging material by electron beam irradiation, the power system comprising a voltage multiplier for generating a high voltage, a first voltage measurement device for measuring an output voltage level of the voltage multiplier and providing a first measured voltage value, and an actuator for modifying the output voltage level of the voltage multiplier based on the first measured voltage value provided by the first voltage measurement device, characterized in that the power system further comprises a second voltage measurement device adapted to independently measure the output voltage level of the voltage multiplier and provide a second measured voltage value.
Public/Granted literature
- US20170179710A1 POWER SYSTEM FOR SUPPLYING HIGH VOLTAGE TO AN ELECTRON BEAM EMITTER Public/Granted day:2017-06-22
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