Invention Grant
- Patent Title: Method of manufacturing a semiconductor device including through silicon plugs
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Application No.: US15069474Application Date: 2016-03-14
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Publication No.: US10049931B2Publication Date: 2018-08-14
- Inventor: Chen-Hua Yu , Hung-Pin Chang , Yung-Chi Lin , Chia-Lin Yu , Jui-Pin Hung , Chien Ling Hwang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semicondutor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semicondutor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/768 ; H01L33/64 ; H01L21/683 ; H01L23/48 ; H01L33/48 ; H01L33/62 ; H01L33/00 ; H01L21/3065 ; H01L21/48 ; H01L23/14 ; H01L23/498 ; H01L23/00

Abstract:
A method of making a semiconductor device is provided including forming a first opening and a second opening in a first surface of a substrate. A conductive material is formed in the first opening and in the second opening and over the first surface in the first region of the substrate between the openings. A thickness of the substrate may be reduced from a second surface of the substrate, opposite the first surface, to a third surface opposite the first surface which exposes the conductive material in the first opening and the conductive material in the second opening. A light emitting diode (LED) device is connected to the third surface of the substrate.
Public/Granted literature
- US20160197014A1 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE INCLUDING THROUGH SILICON PLUGS Public/Granted day:2016-07-07
Information query
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