Invention Grant
- Patent Title: Package structures and methods of making the same
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Application No.: US14928803Application Date: 2015-10-30
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Publication No.: US10049986B2Publication Date: 2018-08-14
- Inventor: Zi-Jheng Liu , Chung-Shi Liu , Hung-Jui Kuo , Yu-Hsiang Hu
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/538 ; H01L21/762 ; H01L21/768 ; H01L23/522 ; H01L23/00 ; H01L21/56

Abstract:
A package structure and method of making the same is provided. A through via is formed on a substrate, the through via extending through a molding material. An upper surface of the molding material is recessed from an upper surface of the through via. A dielectric layer is deposited over the through via and the molding material. The dielectric layer has a first upper surface with a first variation in height between a first area disposed over the through via and a second area disposed over the molding material. Exposure processes are performed on the dielectric layer. The dielectric layer is developed. After the developing, the dielectric layer has a second upper surface with a second variation in height between the first area and the second area. The first variation is greater than the second variation.
Public/Granted literature
- US20170125346A1 Package Structures and Methods of Making the Same Public/Granted day:2017-05-04
Information query
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