Invention Grant
- Patent Title: Low wear debris polyoxymethylene composition and a ramp made of such polyoxymethylene composition suitable for various HDD designs
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Application No.: US15272447Application Date: 2016-09-22
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Publication No.: US10053557B2Publication Date: 2018-08-21
- Inventor: Chi-En Lin , Jung-Pao Chang , Hung-Yu Chi
- Applicant: MIN AIK TECHNOLOGY CO., LTD.
- Applicant Address: TW Taoyuan
- Assignee: MIN AIK TECHNOLOGY CO., LTD.
- Current Assignee: MIN AIK TECHNOLOGY CO., LTD.
- Current Assignee Address: TW Taoyuan
- Agent Winston Hsu
- Main IPC: C08L59/04
- IPC: C08L59/04 ; C08K13/02 ; C08L59/00 ; G11B5/40 ; G11B5/54

Abstract:
A polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a wear resistance agent, a nucleating agent, and an antistatic agent. A ramp is made of the polyoxymethylene composition. The ramp and the polyoxymethylene have excellent low-wear-debris property. The low wear debris polyoxymethylene composition can be used to produce a ramp for many different designs of hard disks, such as PMR (perpendicular recording)+TDMR (Two-Dimensional Magnetic Recording), SMR (Shingled Magnetic Recording), HAMR+ (HAMR (Heat Assisted Magnetic Recording)+SMR+TDMR), BPMR+ (BPMR (Bit Pattern Media Recording)+SMR+TDMR), and helium-filled hard disk.
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