Invention Grant
- Patent Title: Photoresist stripping using intelligent liquids
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Application No.: US15028452Application Date: 2014-10-13
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Publication No.: US10053655B2Publication Date: 2018-08-21
- Inventor: Dirk Schumann
- Applicant: intelligent fluids GmbH
- Applicant Address: DE Leipzig
- Assignee: INTELLIGENT FLUIDS GMBH
- Current Assignee: INTELLIGENT FLUIDS GMBH
- Current Assignee Address: DE Leipzig
- Agency: RatnerPrestia
- Priority: DE102013016870 20131011
- International Application: PCT/EP2014/071915 WO 20141013
- International Announcement: WO2015/052347 WO 20150416
- Main IPC: C11D17/00
- IPC: C11D17/00 ; C11D11/00 ; C11D3/20 ; C11D3/32 ; C11D1/14 ; C11D1/75 ; C11D1/83 ; H01L21/027 ; H01L21/3105 ; H01L21/321
Abstract:
The invention present describes novel cleaning agents based on a multiphase system, the use thereof for removing photoresist coatings from surfaces, and a method for removing photoresist coatings from surfaces. The multiphase system according to the invention is used in particular for removing coatings, photoresist coatings, polymer layers, dirt layers, insulation layers, and metal layers from surfaces.
Public/Granted literature
- US20160230130A1 PHOTORESIST STRIPPING USING INTELLIGENT LIQUIDS Public/Granted day:2016-08-11
Information query
