Invention Grant
- Patent Title: Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications
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Application No.: US14984908Application Date: 2015-12-30
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Publication No.: US10053775B2Publication Date: 2018-08-21
- Inventor: Glenn Kuchenbeiser , Venkateswara R. Pallem , Nicolas Blasco , Jean-Marc Girard
- Applicant: American Air Liquide, Inc. , L'Air Liquide, Societé Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Applicant Address: FR Paris US CA Fremont
- Assignee: L'Air Liquide, Societé Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude,American Air Liquide, Inc.
- Current Assignee: L'Air Liquide, Societé Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude,American Air Liquide, Inc.
- Current Assignee Address: FR Paris US CA Fremont
- Agent Patricia E. McQueeney; Yan Jiang
- Main IPC: C23C16/24
- IPC: C23C16/24 ; C23C16/455 ; C23C16/18
Abstract:
Methods of using Si-containing film forming compositions to deposit silicon-containing films using vapor deposition processes are disclosed. The disclosed Si-containing film forming composition comprises an amino(bromo)silane precursor having the formula: SiHxBry(NR1R2)4−x−y wherein x=0, 1 or 2; y=1, 2 or 3; x+y
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