Invention Grant
- Patent Title: Thermal processing chamber
-
Application No.: US14219644Application Date: 2014-03-19
-
Publication No.: US10053777B2Publication Date: 2018-08-21
- Inventor: Joseph M. Ranish , Aaron Muir Hunter
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C23C16/46 ; C23C16/44 ; C23C16/48 ; C23C16/458

Abstract:
Embodiments described herein provide a substrate processing apparatus that includes a vacuum chamber comprising a first dome and a second dome, a substrate support disposed inside the vacuum chamber between the first and second domes, a collimated energy source arranged in a compartmented housing and positioned proximate the second dome, wherein the second dome is between the collimated energy source and the substrate support. At least a portion of the second dome and the substrate support may be optically transparent to the collimated energy from the collimated energy source.
Public/Granted literature
- US20150267300A1 THERMAL PROCESSING CHAMBER Public/Granted day:2015-09-24
Information query
IPC分类: