Invention Grant
- Patent Title: Method for manufacturing group III nitride substrate formed of a group III nitride crystal
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Application No.: US15313764Application Date: 2015-05-22
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Publication No.: US10053796B2Publication Date: 2018-08-21
- Inventor: Takehiro Yoshida
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-108255 20140526
- International Application: PCT/JP2015/064771 WO 20150522
- International Announcement: WO2015/182520 WO 20151203
- Main IPC: C30B25/18
- IPC: C30B25/18 ; B28D5/00 ; B23K26/364 ; B23K26/402 ; C30B25/20 ; C30B29/40 ; B23K103/00

Abstract:
There is provided a method for manufacturing a group III nitride substrate, including: preparing a plurality of seed crystal substrates formed into shapes that can be arranged with side surfaces opposed to each other; bonding the plurality of seed crystal substrates on a base material by an adhesive agent in an appearance that the seed crystal substrates are arranged with the side surfaces opposed to each other; growing a group III nitride crystals above main surfaces of the plurality of seed crystal substrates, so that crystals grown on each main surface are integrally combined each other; and obtaining a group III nitride substrate formed of the group III nitride crystal.
Public/Granted literature
- US20170247813A1 METHOD FOR MANUFACTURING GROUP III NITRIDE SUBSTRATE Public/Granted day:2017-08-31
Information query
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