Invention Grant
- Patent Title: Adjustable return path magnet assembly and methods
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Application No.: US15193484Application Date: 2016-06-27
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Publication No.: US10056238B2Publication Date: 2018-08-21
- Inventor: Klaus H. W. Hartig
- Applicant: Cardinal CG Company
- Applicant Address: US MN Eden Prairie
- Assignee: Cardinal CG Company
- Current Assignee: Cardinal CG Company
- Current Assignee Address: US MN Eden Prairie
- Agency: Fredrikson & Byron, P.A.
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/34 ; C23C14/35
Abstract:
The invention provides a sputter deposition assembly that includes a sputtering chamber, a sputtering target, and a magnet assembly. The magnet assembly includes a magnetic backing plate with a blind recess into which a moveable magnetic control body can be adjustably disposed.
Public/Granted literature
- US20170372880A1 ADJUSTABLE RETURN PATH MAGNET ASSEMBLY AND METHODS Public/Granted day:2017-12-28
Information query
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