Invention Grant
- Patent Title: Automated optical inspection of unit specific patterning
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Application No.: US15599311Application Date: 2017-05-18
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Publication No.: US10056304B2Publication Date: 2018-08-21
- Inventor: Craig Bishop , Vaibhav Joga Singh Bora , Christopher M. Scanlan , Timothy L. Olson
- Applicant: DECA Technologies Inc.
- Applicant Address: US AZ Tempe
- Assignee: DECA Technologies Inc
- Current Assignee: DECA Technologies Inc
- Current Assignee Address: US AZ Tempe
- Agency: Booth Udall Fuller PLC
- Main IPC: G06K9/00
- IPC: G06K9/00 ; H01L21/66 ; H01L23/00 ; H01L21/78 ; H01L23/544 ; G06F17/50 ; G06T7/00 ; H01L21/768 ; H01L21/56

Abstract:
An automated optical inspection (AOI) system can comprise aligning a wafer comprising a plurality of unit specific patterns. A plurality of unique reference standards can be created as a plurality of electrical nets by generating with a computer an electrical net for each of the unit specific patterns, each of the plurality of electrical nets comprising a start point and an end point. An image of each of the plurality of unit specific patterns can be captured with a camera. The image can be processed with the computer to provide a plurality of extracted boundaries of contiguous electrically conductive regions. Defects in the plurality of unit specific patterns, if present, can be detected by comparing each of the extracted boundaries of contiguous electrically conductive regions to a corresponding one of the plurality of unique reference standards. An output of known good die can be created.
Public/Granted literature
- US20170256466A1 AUTOMATED OPTICAL INSPECTION OF UNIT SPECIFIC PATTERNING Public/Granted day:2017-09-07
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