Invention Grant
- Patent Title: Semicondcutor structure and semiconductor manufacturing process thereof
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Application No.: US15214463Application Date: 2016-07-20
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Publication No.: US10062654B2Publication Date: 2018-08-28
- Inventor: Yu-Chia Lai , Chen-Hua Yu , Chang-Pin Huang , Chung-Shi Liu , Hsien-Ming Tu , Hung-Yi Kuo , Hao-Yi Tsai , Shih-Wei Liang , Ren-Xuan Liu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L23/58 ; H01L23/522 ; H01L23/31 ; H01L23/00

Abstract:
A semiconductor structure has an integrated circuit component, a conductive contact pad, a seal ring structure, a conductive via, a ring barrier, and a mold material. The conductive contact pad is disposed on and electrically connected with the integrated circuit component. The seal ring structure is disposed on the integrated circuit component and surrounding the conductive contact pad. The conductive via is disposed on and electrically connected with the conductive contact pad. The ring barrier is disposed on the seal ring structure. The ring barrier surrounds the conductive via. The mold material covers side surfaces of the integrated circuit component. A semiconductor manufacturing process is also provided.
Public/Granted literature
- US20180025997A1 SEMICONDCUTOR STRUCTURE AND SEMICONDUCTOR MANUFACTURING PROCESS THEREOF Public/Granted day:2018-01-25
Information query
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