Invention Grant
- Patent Title: DMTJ structure for sub-25NM designs with cancelled flowering field effects
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Application No.: US15272413Application Date: 2016-09-21
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Publication No.: US10062732B2Publication Date: 2018-08-28
- Inventor: Dmytro Apalkov , Mohamad Krounbi , Vladimir Nikitin , Volodymyr Voznyuk
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR
- Agency: Renaissance IP Law Group LLP
- Main IPC: H01L27/22
- IPC: H01L27/22 ; G11C11/16 ; H01L43/02 ; H01L43/08 ; H01L43/10

Abstract:
A magnetic memory device comprises a first reference magnetic layer, a first tunnel barrier layer, a second tunnel barrier layer, and a free magnetic layer disposed between the first tunnel barrier layer and the second tunnel barrier layer. A magnitude of an in-plane magnetostatic field from the first reference magnetic layer at an edge of the free magnetic layer is less than about 500 Oe. One embodiment comprises a second reference magnetic layer on the second tunnel barrier layer in which the first reference magnetic layer, the first tunnel barrier layer, the free magnetic layer, the second tunnel barrier layer and the second reference magnetic layer are arranged as a stack, and in which a width of the first tunnel barrier layer, the free magnetic layer, the second tunnel barrier and the second reference magnetic layer in a second direction is less than about 30 nm.
Public/Granted literature
- US20170345868A1 DMTJ STRUCTURE FOR SUB-25NM DESIGNS WITH CANCELLED FLOWERING FIELD EFFECTS Public/Granted day:2017-11-30
Information query
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