Invention Grant
- Patent Title: Method for producing sevoflurane
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Application No.: US15473940Application Date: 2017-03-30
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Publication No.: US10065912B2Publication Date: 2018-09-04
- Inventor: Takaaki Yoshimura , Toshihiko Oono , Shinya Akiba , Masaki Fujiwara
- Applicant: CENTRAL GLASS COMPANY, LIMITED
- Applicant Address: JP Ube-Shi
- Assignee: CENTRAL GLASS COMPANY, LIMITED
- Current Assignee: CENTRAL GLASS COMPANY, LIMITED
- Current Assignee Address: JP Ube-Shi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2017-019555 20170206; JP2017-044726 20170309
- Main IPC: C07C43/00
- IPC: C07C43/00 ; C07C41/42 ; C07C41/22

Abstract:
An object of the present invention is to remove a compound A from “sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)” so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially no compound A, comprising the following steps of: bringing a composition containing hydrogen fluoride (HF) and water at a mass ratio of 1:1 to 1:30 into contact with a 1st organic liquid containing sevoflurane and a compound A, thereby obtaining a 2nd organic liquid containing the compound A in an amount that is lower than that in the 1st organic liquid (step 1a); and distilling the 2nd organic liquid under the presence of a degradation inhibitor, thereby obtaining sevoflurane containing substantially no compound A as a main distillation fraction (step 2).
Public/Granted literature
- US20180222834A1 METHOD FOR PRODUCING SEVOFLURANE Public/Granted day:2018-08-09
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