Invention Grant
- Patent Title: Direct liquid deposition
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Application No.: US14849818Application Date: 2015-09-10
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Publication No.: US10066287B2Publication Date: 2018-09-04
- Inventor: Stephan Voser , Fabio Antonio Ravelli , Bruno Gaechter
- Applicant: Oerlikon Advanced Technologies AG
- Applicant Address: CH Trübbach
- Assignee: EVATEC AG
- Current Assignee: EVATEC AG
- Current Assignee Address: CH Trübbach
- Agency: Pearne & Gordon LLP
- Main IPC: C23C14/22
- IPC: C23C14/22 ; C23C14/24 ; C23C14/26 ; B05B7/16 ; B05B1/06 ; C23C14/12 ; C23C14/02 ; C23C14/50

Abstract:
Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1′). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapor distribution nozzle arrangement (7) into a vacuum recipient (3) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP3′). From the two-component vapor coating substance vapor is applied to substrate 5′ to be coated. In this variant separation of solvent vapor and coating substance vapor is performed especially downstream vaporizing (STEP2′).
Public/Granted literature
- US20150376770A1 DIRECT LIQUID DEPOSITION Public/Granted day:2015-12-31
Information query
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