Invention Grant
- Patent Title: Method for manufacturing a single crystal diamond
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Application No.: US14488629Application Date: 2014-09-17
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Publication No.: US10066317B2Publication Date: 2018-09-04
- Inventor: Hitoshi Noguchi , Daisuke Takeuchi , Satoshi Yamasaki , Masahiko Ogura , Hiromitsu Kato , Toshiharu Makino , Hideyo Okushi
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY , SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY,SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY,SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Oliff PLC
- Priority: JP2013-194539 20130919
- Main IPC: C30B25/16
- IPC: C30B25/16 ; C30B25/18 ; C30B29/04 ; C30B25/10 ; C30B25/12

Abstract:
A method for manufacturing a single crystal diamond in which vapor phase synthetic single crystal diamond is additionally deposited on a single crystal diamond seed substrate obtained by vapor phase synthesis, includes a step of measuring flatness of the seed substrate, a step of determining whether or not to flatten the seed substrate based on the measurement result of the flatness, and any one of the following two steps of a step of additionally depositing the vapor phase synthetic single crystal diamond after flattening the seed substrate for which the flattening is necessary based on the determination and a step of additionally depositing the vapor phase synthetic single crystal diamond without flattening the seed substrate for which the flattening is not necessary based on the determination.
Public/Granted literature
- US20150075420A1 METHOD FOR MANUFACTURING A SINGLE CRYSTAL DIAMOND Public/Granted day:2015-03-19
Information query
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