Invention Grant
- Patent Title: GaN substrate, method for producing GaN substrate, method for producing GaN crystal, and method for manufacturing semiconductor device
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Application No.: US15210150Application Date: 2016-07-14
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Publication No.: US10066319B2Publication Date: 2018-09-04
- Inventor: Yusuke Tsukada , Satoru Nagao , Kazunori Kamada , Masayuki Tashiro , Kenji Fujito , Hideo Fujisawa , Yutaka Mikawa , Tetsuharu Kajimoto , Takashi Fukada
- Applicant: MITSUBISHI CHEMICAL CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI CHEMICAL CORPORATION
- Current Assignee: MITSUBISHI CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Leason Ellis LLP
- Priority: JP2014-006907 20140117; JP2014-090535 20140424; JP2014-104383 20140520; JP2014-118851 20140609; JP2014-122520 20140613; WOPCT/JP2014/070919 20140807; JP2014-168565 20140821
- Main IPC: C30B29/38
- IPC: C30B29/38 ; C30B25/20 ; H01L33/32 ; C30B29/40 ; H01L21/02 ; C30B7/00 ; C30B7/10 ; H01L33/00 ; C30B23/02 ; H01L29/20

Abstract:
A disc-like GaN substrate is a substrate produced by a tiling method and having an angel between the normal line and m-axis on the main surface of the substrate of 0 to 20° inclusive and a diameter of 45 to 55 mm, to 4 or less. In a preferred embodiment, a disc-like GaN substrate has a first main surface and a second main surface that is opposite to the first main surface, and which has an angle between the normal line and m-axis on the first main surface of 0 to 20° inclusive and a diameter of 45 mm or more. The disc-like GaN substrate comprises at least four crystalline regions each being exposed to both of the first main surface and the second main surface, wherein the four crystalline regions are arranged in line along the direction of the orthogonal projection of c-axis on the first main surface.
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