The disclosure relates to an exhaust gas aftertreatment device for purification of exhaust gas emissions. The exhaust gas aftertreatment device is arranged in an exhaust gas passage subsequently of an internal combustion engine and includes an encapsulating portion, a first catalytic substrate and a second catalytic substrate. The second catalytic substrate may be of SCR type. The exhaust gas aftertreatment device includes a reductant injecting device, a pipe and an obstructing portion, where the reductant injecting device is arranged such that reductant is injectable within the pipe and the exhaust gas flow through the pipe can be controlled by the obstructing portion.