- Patent Title: Ion sensor based on differential measurement, and production method
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Application No.: US15113381Application Date: 2015-01-29
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Publication No.: US10067085B2Publication Date: 2018-09-04
- Inventor: Antoni Baldi Coll , Carlos Dominguez Horna , Cecilia Jimenéz Jorquera , César Fernández Sánchez , Andreu Llobera Adan , Ángel Merlos Domingo , Alfredo Cadarso Busto , Isabel Burdallo Bautista , Ferrán Vera Gras
- Applicant: CONSEJO SUPERIOR DE INVESTIGACIONES CIENTIFÍCAS (CSIC)
- Applicant Address: ES Madrid
- Assignee: CONSEJO SUPERIOR DE INVESTIGACIONES CIENTIFICAS (CSIC)
- Current Assignee: CONSEJO SUPERIOR DE INVESTIGACIONES CIENTIFICAS (CSIC)
- Current Assignee Address: ES Madrid
- Agency: Leason Ellis LLP
- Priority: ES201430180 20140211
- International Application: PCT/ES2015/070063 WO 20150129
- International Announcement: WO2015/121516 WO 20150820
- Main IPC: G01N27/403
- IPC: G01N27/403 ; G01N27/414 ; H01L21/78 ; H01L23/31 ; H01L27/12

Abstract:
Ion sensor based on differential measurement comprising an ISFTET-REFET pair wherein the REFET is defined by a structure composed of an ISFET covered by a microreservoir where an internal reference solution is contained. The sensor comprises a first and a second ion-selective field effect transistor, an electrode, a substrate on the surface whereof are integrated the two transistors, connection tracks and the electrode and a structure adhered on the first ion-selective field effect transistor which creates a microreservoir on the gate of said first transistor, with the microreservoir having a microchannel which connects the microreservoir with the exterior and the microreservoir being filled with the reference solution.
Public/Granted literature
- US20170010237A1 ION SENSOR BASED ON DIFFERENTIAL MEASUREMENT, AND PRODUCTION METHOD Public/Granted day:2017-01-12
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