Invention Grant
- Patent Title: Transmittance-variable film and method for producing same
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Application No.: US15039394Application Date: 2014-10-28
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Publication No.: US10067399B2Publication Date: 2018-09-04
- Inventor: Ji-Won Lim , Min-Hee Lee , Ji-Yeon Kim , Dong-Eung Kim
- Applicant: LG Hausys, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Hausys, Ltd.
- Current Assignee: LG Hausys, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Hauptman Ham, LLP
- Priority: KR10-2013-0146486 20131128
- International Application: PCT/KR2014/010189 WO 20141028
- International Announcement: WO2015/080385 WO 20150604
- Main IPC: G02F1/167
- IPC: G02F1/167 ; G02F1/1333

Abstract:
The present invention relates to a transmittance-variable film and a method for producing the same, the film comprising: a transparent substrate; a wire electrode formed on the top of the transparent substrate; an insulating layer formed on the top of the wire electrode; a plurality of partition walls positioned on both sides of the wire electrode; a transparent electrode formed on the top of the plurality of partition walls; a cell configured to be surrounded by the plurality of partition walls, the insulating layer and the transparent electrode; and a charged particle fluid contained inside the cell, wherein the insulating layer is formed with a thickness of 0.4 to 1 μm.
Public/Granted literature
- US20170153525A1 TRANSMITTANCE-VARIABLE FILM AND METHOD FOR PRODUCING SAME Public/Granted day:2017-06-01
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