Invention Grant
- Patent Title: Particle removal system and method thereof
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Application No.: US14275601Application Date: 2014-05-12
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Publication No.: US10067418B2Publication Date: 2018-09-04
- Inventor: Shu-Hao Chang , Chi-Lun Lu , Shang-Chieh Chien , Ming-Chin Chien , Jui-Ching Wu , Jeng-Horng Chen , Chieh-Jen Cheng , Chia-Chen Chen
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: B08B7/00
- IPC: B08B7/00 ; G03F1/82

Abstract:
A method of removing particles from a surface of a reticle is disclosed. The reticle is placed in a carrier, a source gas is flowed into the carrier, and a plasma is generated within the carrier. Particles are then removed from a surface of the reticle using the generated plasma. A system of removing particles from a surface includes a carrier configured to house a reticle, a reticle stocker including the carrier, a power supply configured to apply a potential between an inner cover and an inner baseplate of the carrier, and a gas source configured to flow a gas into the carrier. A plasma may be generated within the carrier, and particles can be removed from a surface of the reticle using the generated plasma. An acoustic energy source configured to agitate at least one of the source gas and the generated plasma may be provided to facilitate particle removal using an agitated plasma.
Public/Granted literature
- US20150323862A1 PARTICLE REMOVAL SYSTEM AND METHOD THEREOF Public/Granted day:2015-11-12
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