Invention Grant
- Patent Title: Photosensitive resin composition for forming interlayer insulating film, interlayer insulating film, and method for forming interlayer insulating film
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Application No.: US15329940Application Date: 2015-08-12
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Publication No.: US10067422B2Publication Date: 2018-09-04
- Inventor: Kazuhide Uno
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO. LTD.
- Current Assignee: TOKYO OHKA KOGYO CO. LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2014-173129 20140827
- International Application: PCT/JP2015/072855 WO 20150812
- International Announcement: WO2016/031580 WO 20160303
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/023 ; G03F7/075 ; G03F7/40 ; G03F7/039 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/022

Abstract:
A photosensitive resin composition for forming an interlayer insulating film, which contains an alkali-soluble resin (A), a photosensitizer (B), a thermal acid generator (T) which generates an acid when heated, and a silane coupling agent (C), and wherein the alkali-soluble resin (A) has a constituent unit (A1) represented by general formula (a-1) or an alicyclic epoxy group-containing unit (A3). In general formula (a-1), R represents a hydrogen atom or a methyl group; and Ra01 represents a hydrogen atom or an organic group having a hydroxyl group.
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Information query
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