Provided is a holding device for vacuum-attracting and holding a substrate, the device comprising: an attracting unit configured to have attraction mechanisms; and a control unit configured to control the attracting unit, wherein the control unit is configured: to acquire a sequence for attracting the substrate and reference data for determining whether the substrate has been successfully attracted, from time-dependent variation in pressure in an attraction mechanism in a case where the substrate is held by the attraction mechanisms; to control the attracting unit to hold a first substrate based on the sequence and to acquire measurement data that indicates time-dependent variation in pressure in the attraction mechanism in a case where the first substrate is held; and to compare the reference data and the measurement data, and to control the attracting unit to hold a second substrate based on the sequence if a comparison result satisfies a predetermined condition.