Invention Grant
- Patent Title: Pattern drawing apparatus and pattern drawing method
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Application No.: US15231842Application Date: 2016-08-09
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Publication No.: US10067429B2Publication Date: 2018-09-04
- Inventor: Eriko Nakajima
- Applicant: ADTEC Engineering Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: ADTEC Engineering Co., Ltd.
- Current Assignee: ADTEC Engineering Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2016-104816 20160526
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G03F9/00 ; G03F7/20

Abstract:
A pattern drawing apparatus includes a first image-pickup device for reading an alignment mark and reading a first pattern image for detecting a positional shift, a second image-pickup device for reading the first pattern image and reading a second pattern image for detecting a positional shift drawn by an irradiation light beam from the optical head while carrying out a relative movement between the table and the optical head, and a positional shift detection unit for obtaining a first coordinate difference between a center of a visual field of the first image-pickup device and a center of the first pattern based on a read image by the first image-pickup device and obtaining a second coordinate difference between the center of the first pattern and a specific position of the second pattern based on a read image by the second image-pickup device.
Public/Granted literature
- US20170343907A1 Pattern Drawing Apparatus and Pattern Drawing Method Public/Granted day:2017-11-30
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