Invention Grant
- Patent Title: Electrostatic chuck device
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Application No.: US15515083Application Date: 2015-09-09
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Publication No.: US10068790B2Publication Date: 2018-09-04
- Inventor: Hitoshi Kouno , Fumihiro Gobou
- Applicant: SUMITOMO OSAKA CEMENT CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Merchant & Gould P.C.
- Priority: JP2014-201304 20140930
- International Application: PCT/JP2015/075612 WO 20150909
- International Announcement: WO2016/052115 WO 20160407
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67

Abstract:
An electrostatic chuck device that adsorbs a plate-like specimen with an electrostatic adsorption electrode and cools the plate-like specimen, including an electrostatic chuck portion, a forming material of which is a ceramic sintered body, and that has one main surface that is a placement surface on which the plate-like specimen is placed, in which a plurality of protrusions supporting the plate-like specimen are provided on the placement surface, the protrusion has a top surface that is in contact with the plate-like specimen and supports the plate-like specimen, and has a cross-sectional area that gradually increases vertically downward from a height position of the top surface, and a cross-sectional area at a distance 0.6 μm vertically downward from a lower end of the top surface of the protrusion is 110% or less of a cross-sectional area of a lower end of the top surface.
Public/Granted literature
- US20170243778A1 ELECTROSTATIC CHUCK DEVICE Public/Granted day:2017-08-24
Information query
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