- Patent Title: Method and apparatus for liquid treatment of wafer shaped articles
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Application No.: US15169427Application Date: 2016-05-31
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Publication No.: US10068792B2Publication Date: 2018-09-04
- Inventor: Karl-Heinz Hohenwarter , Bridget Hill , Hongbo Si
- Applicant: LAM RESEARCH AG
- Applicant Address: AT Villach
- Assignee: LAM RESEARCH AG
- Current Assignee: LAM RESEARCH AG
- Current Assignee Address: AT Villach
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/67

Abstract:
An apparatus for processing wafer-shaped articles comprises a rotary chuck adapted to hold a wafer shaped article thereon. The rotary chuck comprises a peripheral series of pins configured to contact an edge region of a wafer-shaped article. Each of the pins projects from the rotary chuck, and each of the pins comprises a projecting portion having a gripping element at a distal end thereof, and a proximal portion comprising a drive mechanism at a proximal end thereof by which the pin can be rotated. The projecting portion and the proximal portion comprise interengageable connectors configured to allow the projecting and proximal portions to be interconnected by pressing the projecting portion against the proximal portion and to be disconnected by pulling the projecting portion away from the proximal portion.
Public/Granted literature
- US20170345684A1 METHOD AND APPARATUS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES Public/Granted day:2017-11-30
Information query
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