Invention Grant
- Patent Title: Non-volatile semiconductor memory device
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Application No.: US15713926Application Date: 2017-09-25
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Publication No.: US10068910B2Publication Date: 2018-09-04
- Inventor: Kazuhiro Tsumura
- Applicant: SII Semiconductor Corporation
- Applicant Address: JP
- Assignee: ABLIC Inc.
- Current Assignee: ABLIC Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2016-190179 20160928
- Main IPC: G11C11/34
- IPC: G11C11/34 ; H01L27/11521 ; H01L27/112 ; H01L21/8228 ; H01L29/423 ; G11C17/18 ; H01L29/94 ; G11C16/02

Abstract:
Provided is a small-area one-time programmable semiconductor memory device that uses a PNPN structure, which is parasitically generated in a CMOS process. An N-type region provided in a location other than both ends or a P-type region provided in a location other than both the ends is put into a floating state so that PNPN current flows, and a thermal breakdown of a resistor caused by this current is used as a memory element.
Public/Granted literature
- US20180090506A1 NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2018-03-29
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