Invention Grant
- Patent Title: Photodiode array having a charge-absorbing doped region
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Application No.: US14764713Application Date: 2014-01-31
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Publication No.: US10068942B2Publication Date: 2018-09-04
- Inventor: Yang Ni
- Applicant: NEW IMAGING TECHNOLOGIES
- Applicant Address: FR Verrieres le Buisson
- Assignee: NEW IMAGING TECHNOLOGIES
- Current Assignee: NEW IMAGING TECHNOLOGIES
- Current Assignee Address: FR Verrieres le Buisson
- Agency: Womble Bond Dickinson (US) LLP
- Priority: FR1350830 20130131
- International Application: PCT/EP2014/051866 WO 20140131
- International Announcement: WO2014/118308 WO 20140807
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L31/0304 ; H01L31/109 ; H01L31/18

Abstract:
The invention concerns a photodiode array, and the method for producing same, comprising—a cathode comprising at least one substrate layer (4) made from a material from the indium phosphide family and one active layer (5) made from a material from the gallium indium arsenide family, and characterized in that the array further comprises at least two sorts of doped regions of the same type at least partially formed in the active layer (5):—first doped regions (3) forming, with the cathode, photodiodes for forming images,—at least one second doped region (8) absorbing excess charge carriers so as to discharge them.
Public/Granted literature
- US20150372047A1 PHOTODIODE ARRAY HAVING A CHARGE-ABSORBING DOPED REGION Public/Granted day:2015-12-24
Information query
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