Invention Grant
- Patent Title: Field plate power device and method of manufacturing the same
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Application No.: US15442644Application Date: 2017-02-25
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Publication No.: US10068974B2Publication Date: 2018-09-04
- Inventor: Yuan Li , Yi Pei , Feihang Liu
- Applicant: Gpower Semiconductor, Inc.
- Applicant Address: CN
- Assignee: GPOWER SEMICONDUCTOR, INC.
- Current Assignee: GPOWER SEMICONDUCTOR, INC.
- Current Assignee Address: CN
- Agency: Flener IP & Business Law
- Priority: CN201410440179 20140901
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/778 ; H01L29/423

Abstract:
A field plate power device comprises: a substrate; a multilayer semiconductor layer disposed on the substrate; a source electrode, a drain electrode, and a gate electrode located between the source electrode and the drain electrode disposed on the multilayer semiconductor layer; a dielectric layer disposed on the gate electrode, a part of the multilayer semiconductor layer between the gate electrode and the source electrode and another part of the multilayer semiconductor layer between the gate electrode and the drain electrode; a groove disposed in a part of the dielectric layer between the gate electrode and the drain electrode; and a field plate disposed on the groove. The field plate comprises a first portion away from the gate electrode in a horizontal direction, the first portion has an overall upward tilted shape in the horizontal direction away from the gate electrode.
Public/Granted literature
- US20170170284A1 FIELD PLATE POWER DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2017-06-15
Information query
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