Invention Grant
- Patent Title: Semiconductor device having field plate structures, source regions and gate electrode structures between the field plate structures
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Application No.: US15600328Application Date: 2017-05-19
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Publication No.: US10068975B2Publication Date: 2018-09-04
- Inventor: Martin Poelzl
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Vilach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Vilach
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102015100390 20150113
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/40 ; H01L21/02 ; H01L29/78 ; H01L29/417 ; H01L29/08 ; H01L29/06 ; H01L23/535 ; H01L29/10 ; H01L29/423

Abstract:
A semiconductor device includes a semiconductor substrate having a first surface, first and second field plate structures extending in a first direction parallel to the first surface, a plurality of gate electrode structures disposed over the first surface and extending in a second direction parallel to the first surface, the second direction being different than the first direction, and a plurality of source regions and drain regions of a first conductivity type arranged in an alternating manner at the first surface so that a drain region is disposed on one side of a gate electrode structure and a source region is disposed on the other side of the gate electrode structure. The gate electrode structures are disposed between the first and the second field plate structures. The source regions and the drain regions extend in parallel with one another along the second direction.
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