Invention Grant
- Patent Title: Diode
-
Application No.: US15468803Application Date: 2017-03-24
-
Publication No.: US10069017B2Publication Date: 2018-09-04
- Inventor: Shinya Umeki
- Applicant: ROHM CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: ROHM CO., LTD.
- Current Assignee: ROHM CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2016-064021 20160328
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/87 ; H01L29/06 ; H01L29/40 ; H01L29/861 ; H01L29/16 ; H01L29/36

Abstract:
A diode includes an n type semiconductor layer including an n type cathode layer and an n type drift layer that has an impurity concentration lower than the n type cathode layer and that is disposed on the n type cathode layer, a p type anode layer disposed at a surface part of the n type drift layer, a p type hole implantation layer selectively disposed at the n type cathode layer, an anode electrode electrically connected to the p type anode layer, and a cathode electrode electrically connected to the n type cathode layer and to the p type hole implantation layer, and the p type hole implantation layer has a diameter of 20 μm or more.
Public/Granted literature
- US20170278982A1 DIODE Public/Granted day:2017-09-28
Information query
IPC分类: