Invention Grant
- Patent Title: Liquid discharge head and method for manufacturing same
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Application No.: US14835557Application Date: 2015-08-25
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Publication No.: US10076906B2Publication Date: 2018-09-18
- Inventor: Yohei Nakamura
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2014-175515 20140829
- Main IPC: B41J2/45
- IPC: B41J2/45 ; B41J2/14 ; B41J2/16

Abstract:
A liquid discharge head includes an element substrate, a liquid supply substrate, a photosensitive resin layer with which the element substrate and the liquid supply substrate are adhered, and a liquid inflow through-hole penetrating the element substrate, the photosensitive resin layer, and the liquid supply substrate. The element substrate includes a pressure chamber including a discharge opening that discharges liquid, a liquid supply passage, in which one end is connected to the pressure chamber and another end is connected to the liquid inflow through-hole, the liquid supply passage supplying the liquid supplied from the liquid inflow through-hole to the pressure chamber, a diaphragm that forms a surface that opposes the discharge opening of the pressure chamber, a piezoelectric transducer that applies vibration to the diaphragm, and a partition portion, in which one surface opposes the liquid supply passage and another surface opposes the photosensitive resin layer through the diaphragm.
Public/Granted literature
- US20160059559A1 LIQUID DISCHARGE HEAD AND METHOD FOR MANUFACTURING SAME Public/Granted day:2016-03-03
Information query
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