Invention Grant
- Patent Title: Raw material for chemical deposition composed of organoplatinum compound, and chemical deposition method using the raw material for chemical deposition
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Application No.: US15558262Application Date: 2016-05-09
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Publication No.: US10077282B2Publication Date: 2018-09-18
- Inventor: Ryosuke Harada , Toshiyuki Shigetomi , Kazuharu Suzuki , Shunichi Nabeya , Akiko Kumakura , Tatsutaka Aoyama , Takayuki Sone
- Applicant: TANAKA KIKINZOKU KOGYO K.K.
- Applicant Address: JP Tokyo
- Assignee: TANAKA KIKINZOKU KOGYO K.K.
- Current Assignee: TANAKA KIKINZOKU KOGYO K.K.
- Current Assignee Address: JP Tokyo
- Agency: Orrick, Herrington & Sutcliffe LLP
- Agent Joseph A. Calvaruso
- Priority: JP2015-096976 20150512
- International Application: PCT/JP2016/063693 WO 20160509
- International Announcement: WO2016/181916 WO 20161117
- Main IPC: H01L21/31
- IPC: H01L21/31 ; C07F15/00 ; C23C16/18 ; H01L21/285 ; C09D5/24
Abstract:
The present invention relates to a raw material for chemical deposition shown in a formulae below and including an organoplatinum compound in which diimine containing two imines and an alkyl anion are coordinated to divalent platinum. In the formulae, each of substituents R1 to R4 on the diimine represents a hydrogen atom, an alkyl group or the like and has a carbon number of 5 or less. Each of alkyl anions R5 and R6 is an alkyl group having a carbon number of 1 or more and 3 or less. The raw material has high vapor pressure and low decomposition temperature, and thus it is possible to manufacture a platinum thin film at low temperature.
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