Invention Grant
- Patent Title: Metal-film forming apparatus and metal-film forming method
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Application No.: US14979914Application Date: 2015-12-28
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Publication No.: US10077505B2Publication Date: 2018-09-18
- Inventor: Motoki Hiraoka , Hiroshi Yanagimoto , Yuki Sato
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Applicant Address: JP Toyota-shi, Aichi-ken
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota-shi, Aichi-ken
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-265915 20141226
- Main IPC: C25D17/00
- IPC: C25D17/00 ; C25D3/12 ; C25D3/46 ; C25D3/48 ; C25D5/02 ; H05K3/24 ; C25D3/00 ; C25D17/14 ; C25D3/38

Abstract:
A metal-film forming apparatus includes: an anode; a resin substrate having a surface on which a conductor pattern layer that serves as a cathode is formed; a solid electrolyte membrane that contains metal ions and is between the anode and the resin substrate, the solid electrolyte membrane contacting a surface of the conductor pattern layer when a metal film is formed; a power supply; and a conductive member that is arranged contacting the conductor pattern layer when the metal film is formed, such that a negative electrode of the power supply is electrically connected to the conductor pattern layer, the conductive member being detachable from the conductor pattern layer, wherein the metal ions are reduced to deposit metal that forms the metal film on the surface of the conductor pattern layer when the voltage is applied.
Public/Granted literature
- US20160186354A1 METAL-FILM FORMING APPARATUS AND METAL-FILM FORMING METHOD Public/Granted day:2016-06-30
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