Invention Grant
- Patent Title: Magnet assisted stage for vibration and heat reduction in wafer scanning
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Application No.: US15315878Application Date: 2015-06-03
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Publication No.: US10077865B2Publication Date: 2018-09-18
- Inventor: Chinedum E. Okwudire , Deokkyun D. Yoon
- Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
- Applicant Address: US MI Ann Arbor
- Assignee: The Regents of The University of Michigan
- Current Assignee: The Regents of The University of Michigan
- Current Assignee Address: US MI Ann Arbor
- Agency: Harness, Dickey & Pierce, P.L.C.
- International Application: PCT/US2015/033940 WO 20150603
- International Announcement: WO2015/187803 WO 20151210
- Main IPC: H01L21/67
- IPC: H01L21/67 ; F16M11/04 ; F16M11/18 ; G03F7/20 ; G01N21/95
Abstract:
A magnet assisted stage system for scanning applications having a scanning table being moveable from a first position to a second position, a scanning actuator operably associated with the scanning table to move the scanning table along a scanning direction from the first position to the second position, and an actively variable magnetic spring system being operably augmented to the scanning table to exert a magnetic repulsion force upon the scanning table in the scanning direction.
Public/Granted literature
- US20170089506A1 MAGNET ASSISTED STAGE FOR VIBRATION AND HEAT REDUCTION IN WAFER SCANNING Public/Granted day:2017-03-30
Information query
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