Invention Grant
- Patent Title: Power semiconductor contact structure and method for the production thereof
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Application No.: US15523998Application Date: 2015-10-12
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Publication No.: US10079219B2Publication Date: 2018-09-18
- Inventor: Martin Becker , Ronald Eisele , Frank Osterwald , Jacek Rudzki
- Applicant: DANFOSS SILICON POWER GMBH
- Applicant Address: DE Flensburg
- Assignee: Danfoss Silicon Power GmbH
- Current Assignee: Danfoss Silicon Power GmbH
- Current Assignee Address: DE Flensburg
- Agency: McCormick, Paulding & Huber LLP
- Priority: DE102014222819 20141107
- International Application: PCT/EP2015/073562 WO 20151012
- International Announcement: WO2016/071079 WO 20160512
- Main IPC: H01L23/34
- IPC: H01L23/34 ; H01L23/00

Abstract:
A power semiconductor contact structure for power semiconductor modules, which has at least one substrate 1 and a metal molded body 2 as an electrode, which are sintered one on top of the other by means of a substantially uninterrupted sintering layer 3a with regions of varying thickness. The metal molded body 2 takes the form here of a flexible contacting film 5 of such a thickness that this contacting film is sintered with its side 4 facing the sintering layer 3a onto the regions of varying thickness of the sintering layer substantially over the full surface area. A description is also given of a method for forming a power semiconductor contact structure in a power semiconductor module that has a substrate and a metal molded body. The forming of the power semiconductor contact structure is performed firstly by applying a layer of sintering material of locally varying thickness to either the metal molded body 2 or the substrate, followed by sintering together the contacting film 5 with the substrate 1 by using the properties of the layer of sintering material that are conducive to connection, the contacting film 5 being made to develop its distinct form to correspond to the varying thickness of the layer of sintering material 3a.
Public/Granted literature
- US20170317049A1 POWER SEMICONDUCTOR CONTACT STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF Public/Granted day:2017-11-02
Information query
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