Invention Grant
- Patent Title: Method of processing wafer
-
Application No.: US15367558Application Date: 2016-12-02
-
Publication No.: US10083849B2Publication Date: 2018-09-25
- Inventor: Hiroshi Morikazu
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2015-237184 20151204
- Main IPC: H01L21/46
- IPC: H01L21/46 ; H01L21/683 ; H01L21/304 ; H01L21/78 ; H01L23/544

Abstract:
A method of processing a wafer includes placing a supporting substrate in confronting relation to a face side of the wafer and integrally bonding the supporting substrate to the face side of the wafer with a bonding material, grinding a reverse side of the wafer to thin the wafer, cutting the wafer along division lines from the reverse side of the wafer into chips that carry individual devices thereon, placing a protective member on the reverse side of the wafer, applying a laser beam having a wavelength which is able to transmit the supporting substrate in the condition where a focused spot of the laser beam is set in the bonding material, thereby breaking the bonding material, and peeling the supporting substrate off from the devices to separate the chips that carry the individual devices thereon.
Public/Granted literature
- US20170162420A1 METHOD OF PROCESSING WAFER Public/Granted day:2017-06-08
Information query
IPC分类: