Invention Grant
- Patent Title: Vertical SRAM structure with cross-coupling contacts penetrating through common gates to bottom S/D metal contacts
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Application No.: US15654190Application Date: 2017-07-19
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Publication No.: US10083971B1Publication Date: 2018-09-25
- Inventor: Hui Zang , Manfred Eller , Kwan-Yong Lim
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Agent Stephen Scuderi
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L29/78 ; H01L29/66

Abstract:
A vertical SRAM cell includes a first (1st) inverter having a 1st common gate structure operatively connecting channels of a 1st pull-up (PU) and a 1st pull-down (PD) transistor. A 1st metal contact electrically connects bottom source/drain (S/D) regions of the 1st PU and 1st PD transistors. A second (2nd) inverter has a 2nd common gate structure operatively connecting channels of a 2nd PU and a 2nd PD transistor. A 2nd metal contact electrically connects bottom S/D regions of the 2nd PU and 2nd PD transistors. A 1st cross-coupled contact electrically connects the 2nd common gate structure to the 1st metal contact. The 2nd common gate structure entirely surrounds a perimeter of the 1st cross-coupled contact. A 2nd cross-coupled contact electrically connects the 1st common gate structure to the 2nd metal contact. The 1st common gate structure entirely surrounds a perimeter of the 2nd cross-coupled contact.
Information query
IPC分类: