Invention Grant
- Patent Title: Method for producing substrates
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Application No.: US15153327Application Date: 2016-05-12
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Publication No.: US10086493B2Publication Date: 2018-10-02
- Inventor: Harunobu Matsui , Daijitsu Harada , Masaki Takeuchi
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-098267 20150513; JP2015-114759 20150605
- Main IPC: B24B37/10
- IPC: B24B37/10 ; B24B7/24 ; B24B37/04 ; B24B37/08 ; B24B7/22

Abstract:
Proposed herein is a method for producing substrates, particularly those of synthetic quartz glass, while saving the substrate surface from killer defects without resorting to any large-scale apparatus and precision polishing plate, thereby reducing defects and improving yields more than in production with conventional facilities. The method for producing substrates by polishing, includes steps of placing substrate stocks individually in work holes formed in a carrier on a lower polishing plate, bringing an upper polishing plate into contact with the surface of the substrate stocks, with the surface of the substrate stocks being coated with an impact-absorbing liquid and the lower polishing plate being rotated, and rotating the upper and lower polishing plates, with the surface of the substrate stocks being accompanied by a polishing slurry.
Public/Granted literature
- US20160332280A1 METHOD FOR PRODUCING SUBSTRATES Public/Granted day:2016-11-17
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