Invention Grant
- Patent Title: Apparatus and method for detecting faults in multilayer semiconductors
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Application No.: US15257401Application Date: 2016-09-06
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Publication No.: US10088522B2Publication Date: 2018-10-02
- Inventor: Juan Felipe Torres , Kei Matsuoka
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2015-182508 20150916
- Main IPC: G01R31/302
- IPC: G01R31/302 ; G01R31/08 ; G01R31/308 ; G01R31/311 ; G01R1/30 ; G01R1/07 ; G01R31/26 ; G01R31/28

Abstract:
An apparatus according to embodiments detects locations of faults in a multilayer semiconductor (MLS). The apparatus comprises a laser source that outputs a laser beam, an optical system that directs the laser beam selectively onto a target region in the MLS to generate an irradiated zone in the MLS, a stage and a scanner that control a relative position between the irradiated zone and the MLS so that the irradiated zone moves along the target region, a controller system that measures electrical signals or electrical signal changes induced by a temperature increase in the MLS, and identifies a location of the target region and locations of faults in the MLS based on the measured electrical signal or the measured electrical signal changes. The target region is made of a material of which thermal conductivity is higher than that of a material around the target region and has a structure penetrating from shallow layers to deep layers of the MLS.
Public/Granted literature
- US20170074928A1 APPARATUS AND METHOD FOR DETECTING FAULTS IN MULTILAYER SEMICONDUCTORS Public/Granted day:2017-03-16
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