Invention Grant
- Patent Title: Illumination system for microlithography
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Application No.: US15464899Application Date: 2017-03-21
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Publication No.: US10088754B2Publication Date: 2018-10-02
- Inventor: Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102009006685 20090129
- Main IPC: G02B27/64
- IPC: G02B27/64 ; G03F7/20 ; G02B3/00
Abstract:
A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.
Public/Granted literature
- US20170192361A1 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY Public/Granted day:2017-07-06
Information query
