Invention Grant
- Patent Title: Oxide sintered body and sputtering target, and method for producing same
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Application No.: US14427719Application Date: 2013-09-10
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Publication No.: US10090136B2Publication Date: 2018-10-02
- Inventor: Yuki Tao , Hideo Hata , Akira Nambu , Moriyoshi Kanamaru
- Applicant: KOBELCO RESEARCH INSTITUTE, INC.
- Applicant Address: JP Kobe-shi
- Assignee: KOBELCO RESEARCH INSTITUTE, INC.
- Current Assignee: KOBELCO RESEARCH INSTITUTE, INC.
- Current Assignee Address: JP Kobe-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-203576 20120914
- International Application: PCT/JP2013/074338 WO 20130910
- International Announcement: WO2014/042138 WO 20140320
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/08 ; C23C14/34 ; C04B35/457 ; C04B35/01 ; C04B35/453 ; C04B35/64 ; H01L21/02

Abstract:
An oxide sintered body which is obtained by mixing and sintering zinc oxide, indium oxide, gallium oxide and tin oxide. The relative density of the oxide sintered body is 85% or more and the average grain size of crystal grains observed on the surface of the oxide sintered body is less than 10 μm. X-ray diffraction of the oxide sintered body shows that a Zn2SnO4 phase and an InGaZnO4 phase are the main phases and that an InGaZn2O5 phase is contained in an amount of 3 volume % or less.
Public/Granted literature
- US20150248996A1 OXIDE SINTERED BODY AND SPUTTERING TARGET, AND METHOD FOR PRODUCING SAME Public/Granted day:2015-09-03
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