Invention Grant
- Patent Title: TFT substrate, display device and manufacturing method
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Application No.: US15023406Application Date: 2016-02-26
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Publication No.: US10090336B2Publication Date: 2018-10-02
- Inventor: Baixiang Han
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Priority: CN201610057342 20160127
- International Application: PCT/CN2016/074632 WO 20160226
- International Announcement: WO2017/128473 WO 20170803
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/417 ; H01L29/423

Abstract:
A TFT substrate, a display device and a manufacturing method are disclosed. The TFT substrate includes a substrate and a first TFT structure and a second TFT structure formed on the substrate. The first TFT structure includes a first gate pattern and a first semiconductor pattern. The first semiconductor pattern is divided into a first channel region, and a first doping region and a second doping region located at two sides of the first channel region. The first channel region is disposed corresponding to the first gate pattern to form a first conductive channel under the function of first gate pattern. The first doping region is extended inside the second TFT structure as a second gate pattern of the second TFT structure. The present invention uses doping drain of a switching TFT as gate of a driving TFT to save layout space, and beneficial for realization of higher PPI.
Public/Granted literature
- US20180040646A1 TFT Substrate, Display Device And Manufacturing Method Public/Granted day:2018-02-08
Information query
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